Nanometrics Announces the NanoSpec II Film Metrology System for Advanced Material Characterization


Nanometrics Introduces Imperia PL Imaging System for Advanced Compound Semiconductor Manufacturing


Multilayer SiC application for FTIR

A new application has been released for all FTIR systems allowing precise control of multi layer SiC film thickness.


FTIR software v3.4 release

A new version of FTIR GUI is available, addressing stability, automation enhancements and support for new applications such as SiC and GaN thickness measurements.


NanoSpec II NIR Version Released

In addition to the existing configuration options, a Near-IR enhanced spectrometer is available, allowing tight control of a-Si and p-Si materials.




April 5, 2016

Presentation at the Workshop on Metal Organic Chemical Vapor Deposition (MOCVD) - Stanford University, Palo Alto, CA


August 2015

Presentation at the 11th Int'l Conference on Nitride Semiconductors (ICNS-11) - Beijing, China





Stay Connected