The QS 1200 FTIR metrology tool is a desktop system for dopant monitoring, epi thickness measurement, and other applications. QS 1200 is specifically designed for advanced semiconductor fabs performing material characterization in silicon growing and device manufacturing areas. It provides a new level of integration of the FTIR technique utilizing proven optical technology, and a manual wafer tray to accommodate SEMI standard wafers of 100, 125, 150, 200 and 300 mm diameter.
Odd shaped wafer pieces, and 2mm thick silicon slices can also be measured on the QS 1200. An available option is a single wafer mapping (r, theta) stage for all the above wafer sizes.