Specifically designed for non-destructive wafer analysis, the QS 2200 FTIR metrology system is used for the characterization and measurement of semiconductor materials as well as device manufacturing. The QS2200 model is available in two configurations.
Automated system with two open cassette stations
Automated system with an indexer and open cassette system
The QS2200 series incorporates a universal stage, which adjusts automatically to different wafer sizes 100, 125, 150 and 200mm.
Unique algorithms deliver instant qualification of SOI, SiC, and other epitaxial films. Built-in intelligence extends the applicability to almost every film material imaginable. Additionally, it is versatile enough to qualify thickness of recycled test wafers for rapid payback.