Our systems address a broad range of process control requirements for applications in mainstream semiconductor, MEMS, data storage, high-brightness LED (HB-LED) and other III-V semiconductor processes. Nanometrics will continue to develop and offer advanced process control solutions to address future technology roadmap requirement trends.
Nanometrics automated systems include both semi-automated and fully automated metrology systems for use in high or low volume production environments. High performance automated systems provide thin film, photoluminescence, defect and wafer bow for a large variety of front end metrology applications.
Addressing the special needs of flexibility in setup and handling of metrology applications, many of Nanometrics' solutions for R&D allow modularity with a wide range of metrology components that can be incorporated. Nanometrics systems are available as manual loading systems with the option to be upgraded to fully automated process monitoring systems. This type of flexibility to the user ensures the value of a investment over long life cycles and addresses the budget constraints of startups and process R&D centers. Nanometrics also offers traditional tabletop systems for manual analysis of optical and electrical characteristics of dielectric, metal and semiconductor materials.