The QS1200 FTIR metrology tool is a desktop system for dopant monitoring, epi thickness measurement, and other applications. QS1200 is specifically designed for advanced semiconductor fabs performing material characterization in silicon growing and device manufacturing areas. It provides a new level of integration of the FTIR technique utilizing proven optical technology, and a manual wafer tray to accommodate SEMI standard wafers of 100, 125, 150, 200, and 300mm diameter. Odd shaped wafer pieces, and 2mm thick silicon slices can also be used on the QS1200. An available option is a single wafer mapping (r, theta) stage for all the above wafer sizes.
Unique algorithms deliver instant qualification of SOI, SiC, and other epitaxial films. Built-in intelligence extends the applicability to almost every film material imaginable. Additionally, it is versatile enough to qualify thickness of recycled test wafers for rapid payback.